The Adsorption and Desorption of Allylamine on the Silicon(100) Surface

The Adsorption and Desorption of Allylamine on the Silicon(100) Surface

4.11 - 1251 ratings - Source



The AES studies showed propylene saturated on the Si surface by 1 molecule/2 surface dimers, while propylamine saturated on the surface by 1 molecule/2 surface dimers or 1 molecule/2 surface dimmers. The TPD experimental results indicate that all three species can form thermally stable CN or carbide films on the Si surface. Although the silicon carbide film from propylene adsorption possessed higher thermal stability, the formation of the CN film from propylamine and allylamine was energetically favored.1.5 References: 1. Yu, P. Y.; Cardona, M. Fundamentals of Semiconductors: Physics and Materials Properties. Springer. (2004). 2. Fraser, D.A. The Physics of Semiconductor Devices. 4th edition. Oxford. (1986). 3. Carter, C.; Brumbach, M.;anbsp;...


Title:The Adsorption and Desorption of Allylamine on the Silicon(100) Surface
Author:
Publisher:ProQuest - 2008
ISBN-13:

You must register with us as either a Registered User before you can Download this Book. You'll be greeted by a simple sign-up page.

Once you have finished the sign-up process, you will be redirected to your download Book page.

How it works:
  • 1. Register a free 1 month Trial Account.
  • 2. Download as many books as you like (Personal use)
  • 3. Cancel the membership at any time if not satisfied.


Click button below to register and download Ebook
Privacy Policy | Contact | DMCA